Year | Semester | Required Elective | Course ID | Course Name | Credits | Hours | Level | Note |
---|---|---|---|---|---|---|---|---|
學年 | 學期 | 類別 | 課程編碼 | 課程名稱 | 學分 | 時數 | 階段別 | 備註 |
1 | 1 | ▲ | A405010 | IP Research Methodology 智財研究方法 | 1.0 | 1 | □ | |
1 | 1 | ★ | A405001 | Special Topics on Patent Law 專利法專題研究 | 3.0 | 3 | ◎ | |
1 | 1 | ★ | A405002 | Special Topics on Copyright Act 著作權法專題研究 | 3.0 | 3 | ◎ | |
1 | 1 | ★ | A405003 | Special Topics on Trademark Act 商標法專題研究 | 3.0 | 3 | ◎ | |
1 | 1 | ★ | A405101 | Intellectual Property Management for Global Brands 全球品牌智財權管理 | 3.0 | 3 | ||
1 | 1 | ★ | A405102 | Practices for the U.S. IP litigations 美國智財訴訟實務 | 3.0 | 3 | ||
1 | 1 | ★ | A405103 | Japanese Intellectual Property Litigation Practice 日本智財訴訟實務 | 3.0 | 3 | ||
1 | 1 | ★ | A405104 | Intellectual Property Litigation Practices of China 中國大陸智財訴訟實務 | 3.0 | 3 | ||
1 | 1 | ★ | A405105 | Research on Intellectual Property Developments and Strategies across the Taiwan Strait 兩岸智財權發展策略研究 | 3.0 | 3 | ||
1 | 1 | ★ | A405106 | Intellectual Property in Mergers and Acquisitions 智財權與企業併購 | 3.0 | 3 | ||
1 | 1 | ★ | A405140 | Patent Prosecution and Litigation Practice 專利寫作與爭訟實務 | 2.0 | 2 | ||
1 | 2 | ★ | A405004 | International IP management 國際智財權管理 | 3.0 | 3 | ◎ | |
1 | 2 | ★ | A405005 | International IP Agreements & Technology License 國際智權契約與技術移轉 | 3.0 | 3 | ◎ | |
1 | 2 | ★ | A405009 | Case Analysis on Patent Law 專利法案例分析 | 3.0 | 3 | ||
1 | 2 | ★ | A405107 | Intellectual Property Appraisal Research 智財權鑑價研究 | 3.0 | 3 | ||
1 | 2 | ★ | A405108 | The Study of Intellectual Property Crime 智財權犯罪專題研究 | 3.0 | 3 | ||
1 | 2 | ★ | A405109 | Patent Drafting 專利寫作 | 3.0 | 3 | ◎ | |
1 | 2 | ★ | A405110 | Patent strategy analysis 專利佈局與專利策略 | 3.0 | 3 | ||
1 | 2 | ★ | A405111 | Practice in Patent Infringement Verification 專利侵害鑑定實務 | 3.0 | 3 | ◎ | |
1 | 2 | ★ | A405112 | Case Studies of Trademark Law 商標法案例研究 | 3.0 | 3 | ||
1 | 2 | ★ | A405118 | Cyberlaw seminar 網路法律專題研究 | 2.0 | 2 | ||
1 | 2 | ★ | A405120 | Graduate On-Site Research 校外實務研究 | 3.0 | 18 | ||
1 | 2 | ★ | A405121 | Patent disputes in the high-tech industry 高科技產業的專利糾紛 | 1.0 | 1 | ||
1 | 2 | ★ | A405122 | International Intellectual Property Law 國際智財法 | 3.0 | 3 | ◎ | |
1 | 2 | ★ | A405123 | Practice in Patent application 專利申請實務 | 3.0 | 3 | ◎ | |
1 | 2 | ★ | A405124 | The Benchmark of Patent examination 專利審查基準 | 3.0 | 3 | ◎ | |
1 | 2 | ★ | A405131 | Software Patents Seminar 軟體專利專題研究 | 2.0 | 2 | ||
1 | 2 | ★ | A405133 | Economic Analyses of Intellectual Property Rights 智慧財產權經濟分析 | 3.0 | 3 | ||
1 | 2 | ★ | A405135 | Intellectual Property Law Practice 企業智財實習 | 1.0 | 1 | ||
2 | 1 | ▲ | A406001 | Thesis 論文 | 3.0 | 3 | 1 / 2 | |
2 | 1 | ★ | A405113 | Case Study on Copyright Act 著作權法案例研究 | 3.0 | 3 | ||
2 | 1 | ★ | A405114 | Monographic Study on Trade Secret Act and Fair Trade Act 營業秘密法與公平交易法專題研究 | 3.0 | 3 | ◎ | |
2 | 1 | ★ | A405115 | Seminar on civil law 民事法專題研究 | 3.0 | 3 | ||
2 | 1 | ★ | A405116 | Seminar on the Administrative Law 行政法專題研究 | 3.0 | 3 | ◎ | |
2 | 1 | ★ | A405117 | Seminar on the Criminal Law 刑事法專題研究 | 3.0 | 3 | ||
2 | 1 | ★ | A405125 | Patent Application Practices of the U.S. 美國專利申請實務 | 3.0 | 3 | ||
2 | 1 | ★ | A405128 | U.S. Patent Law Seminar 美國專利法專題研究 | 3.0 | 3 | ||
2 | 1 | ★ | A405130 | Entrepreneurship and IP Management 創業與智財管理 | 1.0 | 1 | ||
2 | 2 | ▲ | A406001 | Thesis 論文 | 3.0 | 3 | 2 / 2 | |
2 | 2 | ★ | A405119 | E-Commerce Regulations and Policies 電子商務政策與法律 | 3.0 | 3 | ||
2 | 2 | ★ | A405126 | Patent Application Practices of China 中國專利申請實務 | 3.0 | 3 | ||
2 | 2 | ★ | A405127 | EU Patent Application Practice 歐盟專利申請實務 | 3.0 | 3 | ||
2 | 2 | ★ | A405129 | Special Topics on U.S. Patent Litigation 美國專利訴訟專題研究 | 2.0 | 2 |
1.最低畢業學分:36學分;含基礎必修1學分、基礎必選修12學分、論文6學分、一般選修17學分。
2.碩一期間須修習12門基礎必選修課程中至少四門。於畢業前須取得四門基礎必選修課程之學分數,始符合畢業資格。若修習基礎必選修課程四門以上且及格者,其超出課程之學分數可採計為一般專業選修畢業學分。 3.跨系所選修上限6學分。 4.課程分類圖示:□基礎必修;◎基礎必選修。 5.非法律背景學生須加修科法學程指定科目(行政法、民事訴訟法、刑事訴訟法、民法總則、刑法總則、民法債篇、民法物權篇、英美契約法、公司法等九科目選六科目,至少15學分),始符合畢業條件;法律背景學生包括具法律學位者、具法律輔系資格者、具有考律師資格者、高等檢定考試通過者、具有律師證照者等。法律背景學生應修習基礎理工或產業發展相關課程至少兩門及格,始符合畢業條件。 6.本課程科目表適用於101學年度入學新生。 |