| 課程編碼 Course Code | 中文課程名稱 Course Name (Chinese) | 英文課程名稱 Course Name (English) | 總學分數 Credits | 總時數 Hours |
|---|---|---|---|---|
| C775005 | 真空技術與應用 | Vacuum Technology and Applications | 3.0 | 3 |
| 中文概述 Chinese Description | 本課程擬建立學生對於半導體製程中真空技術等基礎認知，做為未來投入半導體產業時學習製程設備之知識基礎；本課程亦提供真空設備產業資訊與技術概況。 本課程包含半導體製程中真空技術及薄膜工程知識，真空技術內容包含真空原理、系統、量測與測漏；薄膜工程則是在真空技術基礎上，提供學生半導體薄膜製程與設備原理，內容涵蓋半導體元件製程常用之薄膜技術(PVD、CVD、ALD與磊晶)。 | |||
| 英文概述 English Description | In this course, basic knowledges of vacuum technology and thin film engineering will be provided, and can be the foundation for learning semiconductor process equipment as students join the industry. Vacuum equipment and industry outlook will also be covered. Basics of vacuum principle, equipment and measurement/leak detection will be provided in the course. With the basics of vacuum technology, students will further explore the knowledge of thin film processes, such as PVD, CVD, ALD and epitaxy, especially for manufacturing semiconductor devices. The syllabus of course is outlined as follows. | |||
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