| 課程編碼 Course Code | 中文課程名稱 Course Name (Chinese) | 英文課程名稱 Course Name (English) | 總學分數 Credits | 總時數 Hours |
|---|---|---|---|---|
| C775003 | 半導體清洗製程及瑕疵控制技術 | Semiconductor cleaning process and defect reduction technology | 2.0 | 2 |
| 中文概述 Chinese Description | 半導體清洗技術為先進半導體的重要製程，如何以化學反應及物理力將微小的溝槽及隙縫清洗乾淨，是缺陷控制的重要步驟。本課程從半導體清洗製程的基本原理、步驟、到配方組成的介紹，讓學員有一整體性概念，瞭解晶圓清洗製程在晶圓製造上所扮演的角色及其對良率的影響。加入實際案例的介紹與演練，使學員能更清楚如何積累專業背景知識以及如何學以致用，培養出半導體產業的本職學能，提升未來就業基礎與創新能力。 | |||
| 英文概述 English Description | Semiconductor cleaning technology is a crucial process in advanced semiconductor manufacturing. Understanding how to effectively remove defect through chemical reactions and physical forces is a critical stratege in process defect control. This course covers the fundamental principles, steps, and ingredients of semiconductor cleaning processes, providing participants with a comprehensive understanding of the role of wafer cleaning processes in wafer manufacturing and their importance on chip yield. Through practical case studies and exercises, participants gain clarity on how to accumulate professional background knowledge and apply it effectively, fostering the essential skills for the semiconductor industry and enhancing future employment foundations and innovation capabilities. | |||
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