Course Syllabus

Course Information：

Year-Semester Course Number Course Name Phase Credits Hours Required/Elective Instructor Class Student NO. Withdraw Note

Fall Semester
Year 2025 349408 Engineering of Films Coating 1 3.0 3 ★ LIN HWAI EN GME
GMT
IMMA
SSRT
半導體學位學程
DME
機電外國學生專班 23 0 機電甲組選修;製科.機械外.機電博.創新半導體.鐵道合

Year-Semester	Course Number	Course Name	Phase	Credits	Hours	Required/Elective	Instructor	Class	Student NO.	Withdraw	Note
Fall Semester Year 2025	349408	Engineering of Films Coating	1	3.0	3	★	LIN HWAI EN	GME GMT IMMA SSRT 半導體學位學程 DME 機電外國學生專班	23	0	機電甲組選修;製科.機械外.機電博.創新半導體.鐵道合

Course Plan：

Instructor LIN HWAI EN　Office Hours

Email linhe@ntut.edu.tw

Last Updated 2025-05-26 22:06:13

Course Objective 鍍膜製程為近代製造業廣泛利用之表面處理技術，常用於刀具、模具、光學元件、感測器及半導體裝置等。本課程提供物理、化學法鍍膜技術之原理、設備之介紹。並講述膜成核、生長理論與近代薄膜科技於能源、光電、生醫與環境領域之應用。 Film deposition process, a surface treatment technology, has been widely used in modern manufacturing. It is commonly applied in the development of cutters, molds, optical component, sensor and semiconductor devices, etc. This course provides an introduction regarding the basic principle and apparatus of the coating technology (physical and chemical routes). Besides, the film nucleation, growth theory and their applications in energy, optoelectronic, biomedical and environmental fields are described as well.

Course Schedule 第1週 09/08 課程內容簡介 Introduction of the subject 第2週 09/15 材料科學回顧 Materials Science Review 第3週 09/22 物理氣相沉積 Physical vapor deposition (Principle & apparatus of sputtering & thermal evaporative deposition) 第4週 09/29 物理氣相沉積 Physical vapor deposition (Principle & apparatus of sputtering & thermal evaporative deposition) 第5週 10/06 中秋節Moon festival 第6週 10/13 化學氣相沉積 Chemical vapor deposition (Principle & apparatus) 第7週 10/20 化學氣相沉積 Chemical vapor deposition (Principle & apparatus) 第8週 10/27 化學氣相沉積 Chemical vapor deposition (Principle & apparatus) 第9週 11/03 期中考Middle examination 第10週 11/10 電鍍、陽極處理(Electroplating & anodizing treatment) 第11週 11/17 電鍍、陽極處理(Electroplating & anodizing treatment) 第12週 11/24 無電鍍(Electroless deposition) 第13週 12/01 溼式化學法製程 Wet-chemical process (Chemical bath deposition & electroless deposition) 第14週 12/08 薄膜特性 (機械性質、光電特性) Thin film characteristic (Mechanical properties & optoelectronic properties) 第15週 12/15 薄膜分析 (材料性質) Thin film analyses (Materials properties) 第16週 12/22 期末報告 (Final report) 第17週 12/29 期末報告 (Final report) 第18週 01/05 Final exam 期末考

Evaluation and grading policy 1. Participation 出席成績 (10%) 2. Presentation發表 (30%) 3. Middle examination期中考 (30%) 4. Final examination 期末考 (30%)

Materials All right reserved. Do not reproduce without permission.

Foreign-language textbooks:No
1. Handbook of Thin Film Deposition Processes and Techniques, K. Seshan, William Andrew Publishing (2002).

The access to curricular consultation 同學如對課程有問題可於課程中提出，或是在下課時間詢問。
此外也可以下列方式聯絡老師諮詢：
1. 以電子郵件聯絡老師，老師信箱linhe@ntut.edu.tw
Please feel free to contact me if you have any question!
Contact information:
1. Email: linhe@ntut.edu.tw

The course corresponds to the SDGs SDG4：優質教育（Quality Education）
SDG9：產業創新與基礎設施（Industry, Innovation and Infrastructure）

Does the course incorporate AI AI2：鼓勵學生使用生成式AI工具（Encourage students to use generative AI tools）
AI3：使用生成式AI進行課堂即時互動（Use generative AI for real-time classroom interaction）

Note
　

Instructor	LIN HWAI EN　Office Hours
Email	linhe@ntut.edu.tw
Last Updated	2025-05-26 22:06:13
Course Objective	鍍膜製程為近代製造業廣泛利用之表面處理技術，常用於刀具、模具、光學元件、感測器及半導體裝置等。本課程提供物理、化學法鍍膜技術之原理、設備之介紹。並講述膜成核、生長理論與近代薄膜科技於能源、光電、生醫與環境領域之應用。 Film deposition process, a surface treatment technology, has been widely used in modern manufacturing. It is commonly applied in the development of cutters, molds, optical component, sensor and semiconductor devices, etc. This course provides an introduction regarding the basic principle and apparatus of the coating technology (physical and chemical routes). Besides, the film nucleation, growth theory and their applications in energy, optoelectronic, biomedical and environmental fields are described as well.
Course Schedule	第1週 09/08 課程內容簡介 Introduction of the subject 第2週 09/15 材料科學回顧 Materials Science Review 第3週 09/22 物理氣相沉積 Physical vapor deposition (Principle & apparatus of sputtering & thermal evaporative deposition) 第4週 09/29 物理氣相沉積 Physical vapor deposition (Principle & apparatus of sputtering & thermal evaporative deposition) 第5週 10/06 中秋節Moon festival 第6週 10/13 化學氣相沉積 Chemical vapor deposition (Principle & apparatus) 第7週 10/20 化學氣相沉積 Chemical vapor deposition (Principle & apparatus) 第8週 10/27 化學氣相沉積 Chemical vapor deposition (Principle & apparatus) 第9週 11/03 期中考Middle examination 第10週 11/10 電鍍、陽極處理(Electroplating & anodizing treatment) 第11週 11/17 電鍍、陽極處理(Electroplating & anodizing treatment) 第12週 11/24 無電鍍(Electroless deposition) 第13週 12/01 溼式化學法製程 Wet-chemical process (Chemical bath deposition & electroless deposition) 第14週 12/08 薄膜特性 (機械性質、光電特性) Thin film characteristic (Mechanical properties & optoelectronic properties) 第15週 12/15 薄膜分析 (材料性質) Thin film analyses (Materials properties) 第16週 12/22 期末報告 (Final report) 第17週 12/29 期末報告 (Final report) 第18週 01/05 Final exam 期末考
Evaluation and grading policy	1. Participation 出席成績 (10%) 2. Presentation發表 (30%) 3. Middle examination期中考 (30%) 4. Final examination 期末考 (30%)
Materials	All right reserved. Do not reproduce without permission. Foreign-language textbooks:No 1. Handbook of Thin Film Deposition Processes and Techniques, K. Seshan, William Andrew Publishing (2002).
The access to curricular consultation	同學如對課程有問題可於課程中提出，或是在下課時間詢問。此外也可以下列方式聯絡老師諮詢： 1. 以電子郵件聯絡老師，老師信箱linhe@ntut.edu.tw Please feel free to contact me if you have any question! Contact information: 1. Email: linhe@ntut.edu.tw
The course corresponds to the SDGs	SDG4：優質教育（Quality Education） SDG9：產業創新與基礎設施（Industry, Innovation and Infrastructure）
Does the course incorporate AI	AI2：鼓勵學生使用生成式AI工具（Encourage students to use generative AI tools） AI3：使用生成式AI進行課堂即時互動（Use generative AI for real-time classroom interaction）
Note