Course Syllabus

Course Information：

Year-Semester	Course Number	Course Name	Phase	Credits	Hours	Required/Elective	Instructor	Class	Student NO.	Withdraw	Note
Fall Semester Year 2025	350609	Vacuum Technology and Applications	1	3.0	3	★	Chi-Chung Kei	半導體學位學程	18	0	半導體碩班選修課

Course Plan：

Instructor	Chi-Chung Kei
Email	g893552@narlabs.org.tw
Last Updated	2025-05-29 15:58:23
Course Objective	本課程擬建立學生對於半導體製程中真空技術等基礎認知，做為未來投入半導體產業時學習製程設備之知識基礎；本課程亦提供真空設備產業資訊與技術概況。 本課程包含半導體製程中真空技術及薄膜工程知識，真空技術內容包含真空原理、系統、量測與測漏；薄膜工程則是在真空技術基礎上，提供學生半導體薄膜製程與設備原理，內容涵蓋半導體元件製程常用之薄膜技術(PVD、CVD、ALD與磊晶)。 In this course, basic knowledges of vacuum technology and thin film engineering will be provided, and can be the foundation for learning semiconductor process equipment as students join the industry. Vacuum equipment and industry outlook will also be covered. Basics of vacuum principle, equipment and measurement/leak detection will be provided in the course. With the basics of vacuum technology, students will further explore the knowledge of thin film processes, such as PVD, CVD, ALD and epitaxy, especially for manufacturing semiconductor devices. The syllabus of course is outlined as follows.
Course Schedule	(b) 單元主題 1 真空概論 2 氣體分子動力論 3 氣流與氣導 4 真空下物理化學行為 5 真空幫浦 6 真空度量 7 真空材料、元件與封合 真空測試與測漏 期中考 8 真空系統設計 9 物理鍍膜 10 化學鍍膜 11 原子層鍍膜 12 磊晶製程 13 蝕刻製程 14 真空分析設備 期末考
Evaluation and grading policy	期中考 30% 期末考 30% 小考及平常表現 40% Midterm exam 30% Final exam 30% Quiz and participation 40%
Materials	All right reserved. Do not reproduce without permission. Foreign-language textbooks:No a.實用真空技術、ISBN：9789578464452、出版社：國興出版社(新竹黎明)、作者：呂登復. 出版日：1993/11/27。 b.真空技術與應用、ISBN：9789570286762、出版社：全華圖書、作者：國科會精密儀器發展中心、出版日期：2004/03/24。 c.Vacuum Technology、ISBN：0444860274、出版社：Elsevier Science Publishers B.V.、作者：Alexander Roth、出版日：1989/08。
The access to curricular consultation	g893552@niar.org.tw
Expanding teaching and resources
The course corresponds to the SDGs	SDG4：優質教育（Quality Education）
Does the course incorporate AI	● 無（None）
Note	無