Course Syllabus

Course Information：

Year-Semester Course Number Course Name Phase Credits Hours Required/Elective Instructor Class Student NO. Withdraw Note

Spring Semester
Year 2026 357217 Introduction to semiconductor manufacturing technology 1 3.0 3 ★ Mei-Hsin Chen GEOE
IEECSG 0 0 Jointly offered by Electro-Optical Engineering department.

Year-Semester	Course Number	Course Name	Phase	Credits	Hours	Required/Elective	Instructor	Class	Student NO.	Withdraw	Note
Spring Semester Year 2026	357217	Introduction to semiconductor manufacturing technology	1	3.0	3	★	Mei-Hsin Chen	GEOE IEECSG	0	0	Jointly offered by Electro-Optical Engineering department.

Course Plan：

Instructor Mei-Hsin Chen

Email mhchen@mail.ntut.edu.tw

Last Updated 2025-12-10 13:55:54

Course Objective 導論、積體電路生產介紹、半導體基礎、晶圓製造、加熱製程、微影蝕刻、電漿的基礎原理、離子佈植、化學氣相沉積與介電質薄膜、金屬化製程、化學機械研磨、製程整合、CMOS 製程 Introduction、Introduction to IC Fabrication、Semiconductor Basics、 Wafer Manufacturing、Thermal Processes、Photolithography and Etch、 Plasma Basics、Ion Implantation、CVD and Dielectric Thin Film、 Metallization、CMP 、Process Integration、CMOS Processes

Course Schedule Introduction to IC Fabrication ( 1 week ) Semiconductor Basics ( 2 weeks ) Wafer Manufacturing ( 1 week ) Thermal Processes ( 2 weeks ) Photolithography and Etch ( 1 week ) Plasma Basics ( 2 weeks ) Ion Implantation ( 1 week ) CVD and Dielectric Thin Film ( 2 weeks ) Metallization ( 1 week ) CMP ( 1 week ) Process Integration ( 1 week ) CMOS Processes ( 1 week )

Evaluation and grading policy Attendance : 25 % Midterm: 25 % ( close book ) Final term：30 % (close book ) Presentation：20 % (7-10 minutes presentation per person) (Based on how many students attend in this semester)

Materials All right reserved. Do not reproduce without permission.

Foreign-language textbooks:Yes
Introduction to semiconductor manufacturing technology

The access to curricular consultation Please contact with TA.

The course corresponds to the SDGs SDG4：優質教育（Quality Education）
SDG7：可負擔的潔淨能源（Affordable and Clean Energy）

Does the course incorporate AI ● 鼓勵學生使用生成式AI工具（Encourage students to use generative AI tools）
● 使用生成式AI進行課堂即時互動（Use generative AI for real-time classroom interaction）

Note
　

Instructor	Mei-Hsin Chen
Email	mhchen@mail.ntut.edu.tw
Last Updated	2025-12-10 13:55:54
Course Objective	導論、積體電路生產介紹、半導體基礎、晶圓製造、加熱製程、微影蝕刻、電漿的基礎原理、離子佈植、化學氣相沉積與介電質薄膜、金屬化製程、化學機械研磨、製程整合、CMOS 製程 Introduction、Introduction to IC Fabrication、Semiconductor Basics、 Wafer Manufacturing、Thermal Processes、Photolithography and Etch、 Plasma Basics、Ion Implantation、CVD and Dielectric Thin Film、 Metallization、CMP 、Process Integration、CMOS Processes
Course Schedule	Introduction to IC Fabrication ( 1 week ) Semiconductor Basics ( 2 weeks ) Wafer Manufacturing ( 1 week ) Thermal Processes ( 2 weeks ) Photolithography and Etch ( 1 week ) Plasma Basics ( 2 weeks ) Ion Implantation ( 1 week ) CVD and Dielectric Thin Film ( 2 weeks ) Metallization ( 1 week ) CMP ( 1 week ) Process Integration ( 1 week ) CMOS Processes ( 1 week )
Evaluation and grading policy	Attendance : 25 % Midterm: 25 % ( close book ) Final term：30 % (close book ) Presentation：20 % (7-10 minutes presentation per person) (Based on how many students attend in this semester)
Materials	All right reserved. Do not reproduce without permission. Foreign-language textbooks:Yes Introduction to semiconductor manufacturing technology
The access to curricular consultation	Please contact with TA.
The course corresponds to the SDGs	SDG4：優質教育（Quality Education） SDG7：可負擔的潔淨能源（Affordable and Clean Energy）
Does the course incorporate AI	● 鼓勵學生使用生成式AI工具（Encourage students to use generative AI tools） ● 使用生成式AI進行課堂即時互動（Use generative AI for real-time classroom interaction）
Note